PI-KEM, alongside our partners MTI Corporation, offer a wide range of furnaces, ovens, heat treating systems, and other thermal processing tools that are used in a variety of industries.
Industries include:
- Semiconductors
- Solar cells
- Batteries
- Catalysis
- Materials science
MTI offer a comprehensive range of furnaces, from small benchtop units to large industrial furnaces, which can be used for a variety of applications, including:
- Annealing
- Solid-state diffusion
- Sintering
- Crystallisation
- Glass transition
- Wafer bonding
- Ceramic processing
- Metal processing
- Plastics processing
Most furnace types are available in glove box options and a customisation service is available.
Furnace Accessories
A full range of furnace accessories, consumables and spares can be purchased; Some are kept as off stock items.
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Muffle Furnaces
- Temperature range 400-1800°C
- Volume: 1 litre – 125 litres
- Front and top loading
- Chamber materials include alumina, corundum, and alloy
- 1, 3 and 5 walled heating
- Single or dual zone
- Bench top up to 1800°C, can be used for dental sintering of porcelain and zirconia materials
Click here for the full MTI range
Graphitisation furnaces also available
Tube Furnaces
- 1 - 12 zones
- Temperature range 400-1800°C
- Single zone 250 – 2300°C
- 1” – 11” tube diameters
- Single or dual tube
- Tube materials include quartz and mullite
- Horizontal or vertical
- Options for sintering available
Click here for the full MTI range
Graphitisation furnaces also available
CVD Furnace System
- 1 - 3 zones
- Max working temperature range 1200 - 1700°C
- Single or multi-channel gas mixers
- Integrated or external vacuum
- Flanges available in PTFE, stainless steel; fixed and sliding
- Tube materials include quartz and alumina
- Standard or hi-vacuum
- PECVD static or rotary
- Fixed and sliding tubes for graphene and carbon nanotube (CNT) growth
Click here for the full MTI range
High Pressure & Hydrogen Gas Furnaces
- Utilise HIP for the synthesis of new materials
- Max working temperature range 800 -2900°C
- Single or multi-channel gas mixers with optional inert gas support
- Chamber and tube materials include stainless steel, Ni-based superalloy, alumina
- Horizontal or vertical
- Static, rocking, or rotary options
- Vacuum hot pressing options available for bonding, laminating, and pelleting
- Hydrogen gas options for heat treatment of oxidation-sensitive materials
Click here for the full MTI range
RTP Furnaces
- For rapid thermal processing (RTP) of wafers and other substrates
- Max working temperature range 800 - 2900°C
- Max wafer size 12”
- With atmosphere-controlled options
- Standard, microwave, and ultrafast heating
- Static, rotating and pressing options
- Static, sliding flange or sliding furnace
- Standard, rapid, and quenching cooling
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Crystal Growth System
- Available in Bridgman, CZ, Top seeded, Epitaxial, Vacuum Levitation, Swingable, Arc Melting, LPE, and Hybrid format
- Max working temperature range 1200 - 3000°C
- With atmosphere controlled options
- Standard, microwave, and ultrafast heating
- Static, rotating and pressing options
- Static, sliding flange or sliding furnace
- Standard, rapid, and quenching cooling
- Zone melting with directional solidification furnaces available
Click here for the full MTI range
Melting Furnace
- Available in compact, vertical, and high vacuum
- Max working temperature range 100 - 1250°C
- Programmable to +/-1°C
- Benchtop and glovebox compatible models
- Alumina liners for energy saving
- Crucibles available in graphite, quartz, boron nitride and stainless steel
- Stirring function, furnace tube, and vacuum pumps available as options
Click here for the full MTI range
See melting and casting section for Melting-Casting and Levitation furnaces
